SNI INSight Showcasing research and activities of the Swiss Nanoscience Institute About this publication: Design concept: STUDIO NEO Concept, text and layout: C. Möller, B. Utinger, M. Poggio Translations and proofreading: UNIWORKS (Erlangen, Germany) Image credits: C. Möller and named sources © Swiss Nanoscience Institute, June 2025 Cover image: As part of a Nano-Argovia project, researchers are applying wafer-thin coatings using a state-of- the-art sputtering system at Park Innovaare. 33 SNI INSight June 2025